| 摘要 |
PURPOSE: A method for fabricating a photoresist pattern is provided to improve production yield by stably forming an ultra-fine pattern, and to reduce money needed to purchase equipment by improving resolution. CONSTITUTION: A photoresist layer is applied on a lower layer. An exposure process is performed regarding a predetermined portion of the photoresist layer. A photo base generated is added to the exposed photoresist layer so that a part of the acid generated by a photo acid generator existing in the photoresist layer is neutralized to a base. The photoresist layer is developed to form the photoresist pattern.
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