发明名称 |
METHOD OF REMOVING AZO DISULFONIC ACID, METHOD OF FORMING PLATING FILM, AND METHOD OF MANUFACTURING ELECTRONIC CERAMIC MULTI-LAYER COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of removing azo disulfonic acid, which can remove azo disulfonic acid easily without disposing a part of a plating bath. SOLUTION: This method comprises steps of adding a precipitate containing a compound of lanthanide element to the plating bath containing nickel sulfamate, of which the concentration of the azo disultonic acid has reached the predetermined value; obtaining a precipitate by reacting at least a part of the azo disultonic acid with the above precipitant; and removing the above precipitate from the plating bath.
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申请公布号 |
JP2002194600(A) |
申请公布日期 |
2002.07.10 |
申请号 |
JP20000397457 |
申请日期 |
2000.12.27 |
申请人 |
TDK CORP |
发明人 |
MIYASHITA MASATAKA |
分类号 |
C25D3/12;C25D7/00;C25D21/18;H01G4/12;(IPC1-7):C25D21/18 |
主分类号 |
C25D3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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