发明名称 METHOD OF REMOVING AZO DISULFONIC ACID, METHOD OF FORMING PLATING FILM, AND METHOD OF MANUFACTURING ELECTRONIC CERAMIC MULTI-LAYER COMPONENT
摘要 PROBLEM TO BE SOLVED: To provide a method of removing azo disulfonic acid, which can remove azo disulfonic acid easily without disposing a part of a plating bath. SOLUTION: This method comprises steps of adding a precipitate containing a compound of lanthanide element to the plating bath containing nickel sulfamate, of which the concentration of the azo disultonic acid has reached the predetermined value; obtaining a precipitate by reacting at least a part of the azo disultonic acid with the above precipitant; and removing the above precipitate from the plating bath.
申请公布号 JP2002194600(A) 申请公布日期 2002.07.10
申请号 JP20000397457 申请日期 2000.12.27
申请人 TDK CORP 发明人 MIYASHITA MASATAKA
分类号 C25D3/12;C25D7/00;C25D21/18;H01G4/12;(IPC1-7):C25D21/18 主分类号 C25D3/12
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