发明名称 METHOD OF SECURING ETCHING PROCESS MARGIN IN LIQUID CRYSTAL DISPLAY PANEL
摘要 PURPOSE: A method of securing etching process margin in a liquid crystal display panel is provided to form a data line or a gate of the liquid crystal display panel using CO/Al/CO films to improve etching margin and etching yield when a via hole is etched. CONSTITUTION: CO/Al/CO films are laminated as a gate electrode layer(4) on a glass substrate(2) and patterned through photolithography. A gate insulating layer, a data line, and a pixel electrode are formed on the CO/Al/CO films. Since the CO/Al/CO films are used as the gate electrode layer, etch selectivity of the gate insulating layer and the gate electrode is secured when a via hole(12) is dry-etched.
申请公布号 KR20020056691(A) 申请公布日期 2002.07.10
申请号 KR20000086096 申请日期 2000.12.29
申请人 HYUNDAI DISPLAY TECHNOLOGY INC. 发明人 JUN, SEUNG IK;KO, IK HWAN
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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