发明名称 |
METHOD OF SECURING ETCHING PROCESS MARGIN IN LIQUID CRYSTAL DISPLAY PANEL |
摘要 |
PURPOSE: A method of securing etching process margin in a liquid crystal display panel is provided to form a data line or a gate of the liquid crystal display panel using CO/Al/CO films to improve etching margin and etching yield when a via hole is etched. CONSTITUTION: CO/Al/CO films are laminated as a gate electrode layer(4) on a glass substrate(2) and patterned through photolithography. A gate insulating layer, a data line, and a pixel electrode are formed on the CO/Al/CO films. Since the CO/Al/CO films are used as the gate electrode layer, etch selectivity of the gate insulating layer and the gate electrode is secured when a via hole(12) is dry-etched.
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申请公布号 |
KR20020056691(A) |
申请公布日期 |
2002.07.10 |
申请号 |
KR20000086096 |
申请日期 |
2000.12.29 |
申请人 |
HYUNDAI DISPLAY TECHNOLOGY INC. |
发明人 |
JUN, SEUNG IK;KO, IK HWAN |
分类号 |
G02F1/136;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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