Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

摘要

The present invention provides heterobicyclo compounds of the formula:and a method for preparing the same, where Z, X, R1, R2, and m are those defined herein. Compounds of the present invention can be used as monomers for preparing a photoresist resin which is useful, for example, ultra-violet wavelength photolithography processes.