| 发明名称 |
Sputtering targets comprising aluminides or silicides |
| 摘要 |
Described is an in situ method for producing articles of metal aluminide or silicide by reactive sintering and vacuum hot pressing powders and products, such as sputtering targets, produced.
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| 申请公布号 |
US6417105(B1) |
申请公布日期 |
2002.07.09 |
| 申请号 |
US20000578829 |
申请日期 |
2000.05.24 |
| 申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
SHAH RITESH P.;MORALES DIANA L.;KELLER JEFFREY A. |
| 分类号 |
B22F3/10;B22F3/23;C22C1/04;C22C21/00;C22C29/04;C23C14/34;H01L21/285;(IPC1-7):H01L21/44 |
主分类号 |
B22F3/10 |
| 代理机构 |
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代理人 |
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