发明名称 SYSTEM FOR REMOVING RESIDUAL QUANTITY OF SILVER IN TANTALUM CAPACITOR
摘要 PURPOSE: A system for removing a residual quantity of a silver in a tantalum capacitor is provided to reduce product costs by removing a residual quantity of a silver remained in the tantalum capacitor. CONSTITUTION: A cylinder(12) is locked to a base(11). A clean tub(13) is connected to the cylinder(12). A vacuum pump(14) is connected to one side of the clean tub(13). A hose(15) is connected to a lower surface of the clean tub(13). The hose(15) is connected to a collection box(16). A silver is coated on a tantalum element(1). When the tantalum element(1) is located on the clean tub(13), the cylinder(12) is driven so that the tantalum element is located at an upper portion of the clean tub(13). When the tantalum element is located at an upper portion of the clean tub(13), the vacuum pump(14) is driven to remove a residual quantity of a silver remained in the tantalum element(1). The residual quantity of a removed silver is stored in the collection box(16) through the hose(15).
申请公布号 KR20020055525(A) 申请公布日期 2002.07.09
申请号 KR20000084263 申请日期 2000.12.28
申请人 PARTSNIC CO., LTD. 发明人 KIM, GEUN BAE
分类号 H01G13/00 主分类号 H01G13/00
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