发明名称 |
METHOD AND SYSTEM OF DISINFECTION USING LOW FREQUENCY PLASMA |
摘要 |
PROBLEM TO BE SOLVED: To reduce the quantity of reactive chemicals remaining in a disinfected article and to simplify the structure of an disinfection device. SOLUTION: A method and a system of disinfection utilizing the low frequency gas discharge are provided. The method of disinfection comprises disposing an article in a vacuum room 12 and reducing the pressure in the vacuum room to a prescribed pressure value. Chemical species of gas or vapor are introduced into the vacuum room 12, and the low frequency plasma with the frequency of 0-200 kHz is generated inside the vacuum room 12. The low frequency plasma is sustained for a period of time sufficient for removing almost all the chemical species of gas or vapor from the article. |
申请公布号 |
JP2002191679(A) |
申请公布日期 |
2002.07.09 |
申请号 |
JP20010306866 |
申请日期 |
2001.10.02 |
申请人 |
ETHICON INC |
发明人 |
PLATT ROBERT C JR;AGAMOHAMADI MITCH |
分类号 |
H05H1/42;A61L2/14;A61L2/20 |
主分类号 |
H05H1/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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