发明名称 |
Alternating phase shift mask and method for fabricating the alignment monitor |
摘要 |
A new process for fabricating an alternating phase-shifting photomask having an alignment monitor is described. An opaque layer is provided overlying a substrate. The opaque layer is patterned to provide a mask pattern. A phase-shifting pattern is formed on the substrate wherein a portion of the phase-shifting pattern comprises an alignment monitor whereby alignment between the mask pattern and the phase-shifting pattern can be tested.
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申请公布号 |
US6416909(B1) |
申请公布日期 |
2002.07.09 |
申请号 |
US20000618673 |
申请日期 |
2000.07.18 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
QUEK SHYUE FONG;ANG TING CHEONG;CHOO SWEE HONG;LOONG SANG YEE |
分类号 |
G03F1/00;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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