| 摘要 |
PURPOSE: A multi-mask exposure system is provided to increase yield and resolution, by changing an exposure scanner and a stepper system so that mask contrast is more improved than a conventional mask process. CONSTITUTION: The second mask(20) having a layout equal or similar to the first mask(10) is disposed in the periphery of the blade of conventional exposure equipment of the multi-mask exposure system. A plurality of masks having a layout equal or similar to the first mask are disposed in a conventional exposure system. A synchronous control imaging system is further installed to simultaneously control the first mask and the second mask.
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