| 摘要 |
PURPOSE: To achieve practical application of a pattern transfer process by using a gray-tone mask having a gray-tone part which is constituted by a micro- light-shielding pattern lower than a limit of resolution of an exposing equipment that uses the gray-tone mask. CONSTITUTION: A contour pattern 30 is, for example, formed at the side of the gray-tone part 3 along a contour shape of a light shielding pattern 1 which contacts with the gray tone-part 3.
|
