发明名称 |
POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND PHOTOMECHANICAL PROCESS |
摘要 |
PROBLEM TO BE SOLVED: To provide a photomechanical process for a positive photosensitive planographic printing plate having a large development latitude and excellent in processing stability. SOLUTION: The positive photosensitive planographic printing plate has a positive photosensitive composition layer containing a photothermal converting material and an alkali-soluble resin on the base and a layer not substantially containing a photothermal converting material on the photosensitive composition layer. |
申请公布号 |
JP2002189292(A) |
申请公布日期 |
2002.07.05 |
申请号 |
JP20000388066 |
申请日期 |
2000.12.21 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
TSURUYA YASUYUKI |
分类号 |
G03F7/004;G03F7/00;G03F7/032;G03F7/11 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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