发明名称 POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND PHOTOMECHANICAL PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a photomechanical process for a positive photosensitive planographic printing plate having a large development latitude and excellent in processing stability. SOLUTION: The positive photosensitive planographic printing plate has a positive photosensitive composition layer containing a photothermal converting material and an alkali-soluble resin on the base and a layer not substantially containing a photothermal converting material on the photosensitive composition layer.
申请公布号 JP2002189292(A) 申请公布日期 2002.07.05
申请号 JP20000388066 申请日期 2000.12.21
申请人 MITSUBISHI CHEMICALS CORP 发明人 TSURUYA YASUYUKI
分类号 G03F7/004;G03F7/00;G03F7/032;G03F7/11 主分类号 G03F7/004
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