发明名称 MANUFACTURE OF IC MEDIUM USING ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To provide a method capable of mass-producing an IC medium at a low cost, whose base material is not deformed or deteriorated at a low cost. SOLUTION: This method for manufacturing the IC medium where other parts of the base material or another base material are laminated on the base material on which an antenna with an IC chip mounted thereon is formed by using an adhesive, uses an electron radiation curing adhesive including a compound cured by an electron radiation as the adhesive and cures the other parts or the other base material by emitting electron radiation to laminate the other parts or the other base material.
申请公布号 JP2002189999(A) 申请公布日期 2002.07.05
申请号 JP20000388761 申请日期 2000.12.21
申请人 TOPPAN FORMS CO LTD 发明人 ENDO YASUHIRO;MARUYAMA TORU
分类号 B42D15/10;G06K19/07;G06K19/077 主分类号 B42D15/10
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