PHASE SHIFT MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask blank having a phase shifter formed with a film based on a fluorine doped metal silicide as a phase shift mask blank obtained by forming at least one phase shifter on a transparent substrate and to provide a phase shift mask and a method for producing the phase shift mask. SOLUTION: The phase shift mask blank and phase shift mask have satisfactory transmittance and age stability even when a short wavelength light source is used and have such high performance that they can be adapted to the refining and higher integration of a semiconductor integrated circuit.