DESIGN TRANSFER APPARATUS AND DESIGN TRANSFER METHOD

摘要

PROBLEM TO BE SOLVED: To provide a design transfer apparatus which transfers and forms designs of a pattern plate consisting of a glass dry plate formed with the designs as latent images to an unexposed glass dry plate and is extremely little in mispositioning of the designs by transfer. SOLUTION: The design transfer apparatus which transfers and forms the designs of the pattern plate consisting of the glass dry plate formed with the designs as the latent images to the unexposed glass dry plate has a surface plate which holds the unexposed glass dry plate by vacuum evacuation on the surface on the side opposite to the photosensitive material layer forming surface and a frame which holds the pattern plate in its peripheral part by evacuation. The apparatus holds the unexposed glass dry plate on the surface plate and holds the pattern plate at the frame. The apparatus mates the design forming surface of the pattern plate and the photosensitive material layer forming surface of the unexposed glass dry plate in the state of holding the photosensitive material layer forming surface of the unexposed glass dry plate and the design forming surface of the pattern plate so as to face each other. Then the apparatus brings the pattern plate and the unexposed glass dry plate into tight contact with each other and exposures the glass dry plate by a prescribed light source from the pattern plate side. The surface plate is a stone surface plate or ceramics surface plate.