OPTICAL ELEMENT DEFORMATION SYSTEM, SPECIFIC DEFORMATION SYSTEM FOR OPTICAL ELEMENT, AND SPECIFIC DEFORMATION METHOD OF OPTICAL ELEMENT

摘要

PROBLEM TO BE SOLVED: To remove an image error of an optical element in the projection lens, and to actively adjust the image error. SOLUTION: In a specific deformation system of the optical element in the projection exposure machine especially having the projection lens of the micro- lithography use in the imaging apparatus for removing the image error or actively adjusting the image error, a piezoelectric element 3 is adhered to or integrated into the surface to be deformed as an actuator of the thin plate, thin film, or thin layer. By combining with an adaptronic servo loop having a sensor 4, and controlling the operation of the piezoelectric element 3 as an actuator, a force and/or a moment are added to the optical element, and the optical element is specified and deformed.