HALFTONE PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To reduce the number of steps required to produce a halftone phase shift mask, to reduce the time and cost required to produce the mask, to enhance yield and to provide a halftone phase shift mask having high size controllability. SOLUTION: A light shielding zone comprising a resist is formed on a halftone film comprising a photosensitive composition to obtain a halftone phase shift mask structure.