发明名称 PLASMA TREATMENT METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment method and apparatus for homogeneously treatment a body to be treated in a treatment chamber and prolonging the service life of the device. SOLUTION: An induced electromagnetic field that is induced by an antenna coil 11, that is provided at the atmospheric side of a dielectric window 5 and is connected to a high-frequency power supply 4, is made uniform by metal thin films 12, 12a-12l, that are provided near the antenna coil 11.
申请公布号 JP2002190450(A) 申请公布日期 2002.07.05
申请号 JP20000388865 申请日期 2000.12.21
申请人 TOSHIBA CORP 发明人 NIIMURA TADASHI;YAMAUCHI TAKEMOTO;YAMAHANA MASASHI;FUKUMIZU HIROYUKI
分类号 H05H1/46;B01J19/08;C23C16/507;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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