发明名称 |
METHOD AND APPARATUS FOR PRETREATMENT OF METAL ANALYSIS SAMPLE, AND ANALYZER FOR ELEMENT IN METAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a means whose operability for removing contamination on the surface part of a sample is satisfactory, when trace components in a metal are analyzed, and to provide an analyzer for an element in the metal by using the means. SOLUTION: In the pretreatment method for a metal analytical sample, before the component in the metal is analyzed, the surface of the metal analysis sample is sputtered and cleaned inside a pretreatment chamber maintained at inert-gas atmosphere. While the metal analysis sample is being supported from the bottom face side by a sample receiver whose ratio of a contact area to the metal analytical sample is very small, it is subjected to sputtering.
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申请公布号 |
JP2002189023(A) |
申请公布日期 |
2002.07.05 |
申请号 |
JP20010315324 |
申请日期 |
2001.10.12 |
申请人 |
KAWASAKI STEEL CORP;ABIKO KENJI;ULVAC FUAI KK;NIPPON ANALYST KK |
发明人 |
YASUHARA HISAO;SHIMURA MAKOTO;ABIKO KENJI;IWAI HIDEO;ARAIDA TAKASHI |
分类号 |
G01N1/34;G01N33/20;(IPC1-7):G01N33/20 |
主分类号 |
G01N1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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