发明名称 DETECTOR AND METHOD FOR DETECTING FOREIGN MATTER AND DEFECT
摘要 PROBLEM TO BE SOLVED: To accurately and quickly discriminate and detect a defect such as a flaw and a foreign matter, in inspection for an inspection object such as a semiconductor wafer. SOLUTION: This detector is provided with a detecting means for detecting a reflection-scattered beam, from the inspection object, of a laser beam emitted toward the inspection object in plural directions, and for comparing detected results to detect directivity of the reflection-scattered beam.
申请公布号 JP2002188999(A) 申请公布日期 2002.07.05
申请号 JP20000388628 申请日期 2000.12.21
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 OSHIMA YOSHIMASA;NOGUCHI MINORU;NISHIYAMA HIDETOSHI;HAMAMATSU REI;SUZUKI SHINICHI
分类号 G01N21/956;(IPC1-7):G01N21/956 主分类号 G01N21/956
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