发明名称 |
DETECTOR AND METHOD FOR DETECTING FOREIGN MATTER AND DEFECT |
摘要 |
PROBLEM TO BE SOLVED: To accurately and quickly discriminate and detect a defect such as a flaw and a foreign matter, in inspection for an inspection object such as a semiconductor wafer. SOLUTION: This detector is provided with a detecting means for detecting a reflection-scattered beam, from the inspection object, of a laser beam emitted toward the inspection object in plural directions, and for comparing detected results to detect directivity of the reflection-scattered beam.
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申请公布号 |
JP2002188999(A) |
申请公布日期 |
2002.07.05 |
申请号 |
JP20000388628 |
申请日期 |
2000.12.21 |
申请人 |
HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD |
发明人 |
OSHIMA YOSHIMASA;NOGUCHI MINORU;NISHIYAMA HIDETOSHI;HAMAMATSU REI;SUZUKI SHINICHI |
分类号 |
G01N21/956;(IPC1-7):G01N21/956 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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