METHOD FOR UNIFORMLY CONTROLLING CONCENTRATION OF AL IN PLATING BATH USING REALTIME COIL INFORMATION

摘要

PURPOSE: A method is provided which uniformly controls concentration of Al in a plating bath by injecting the selected types and amounts of ingot into the plating bath after realtime receiving coil information of an inlet conveyor from a high level computer, and selecting types and amounts of ingot conforming to operation conditions of each coils. CONSTITUTION: In a concentration control method for uniformly maintaining concentration of Al in a plating bath in hot dip coating in which Al coating is performed by passing a strip uncoiled from a strip coil stacked on an inlet conveyor through the plating bath, the concentration control method comprises the steps of inputting information on dimensions of the strip coil stacked on the inlet conveyor; inputting operation conditions including an indication value of plating amount coated on the surface of the strip; calculating amount of Al consumed in the plating bath per unit time from the inputted information on dimensions of the strip coil and the operation conditions; and calculating the number of ingots to be injected per unit time from the calculated consumed amount of Al, wherein the concentration control method further comprises the steps of calculating amount of Al to be injected per day from the inputted operation conditions and the calculated amount of Al consumed in the plating bath per unit time; selecting types of ingot considering the calculated injection amount per day; and calculating the number of ingots to be injected per day from the calculated injection amount per day and the selected types of ingot.