发明名称 Method for fabricating a patterned layer
摘要 A method for fabricating a patterned layer from a layer material. The method includes steps of: providing a substrate with at least one target region and at least one migration region; applying a layer material; adding a material to the layer material; and performing a heat treatment such that the layer material migrates from the migration region to the target region and a layer which is self-aligned and self-patterned with respect to the target region is formed. The method has the advantage that the layer material, which can often only be etched with difficulty, does not have to be patterned directly. The desired structure of the layer is predetermined by preliminarily structuring the substrate into a target region and a migration region, and is produced by the migration of the layer material as a result of the heat treatment.
申请公布号 US2002086511(A1) 申请公布日期 2002.07.04
申请号 US20010027532 申请日期 2001.12.26
申请人 HARTNER WALTER;KASKO IGOR;WEINRICH VOLKER;HINTERMAIER FRANK;SCHINDLER GUNTHER;WENDT HERMANN 发明人 HARTNER WALTER;KASKO IGOR;WEINRICH VOLKER;HINTERMAIER FRANK;SCHINDLER GUNTHER;WENDT HERMANN
分类号 H01L21/02;H01L21/768;H01L21/8242;(IPC1-7):H01L21/44;H01L21/476;H01L27/108 主分类号 H01L21/02
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