发明名称 |
Varible surface hot plate for improved bake uniformity of substrates |
摘要 |
A system, method and apparatus are described for improving critical dimension uniformity in baked substrates. The system, method and apparatus provide for varying the distance between a substrate to be baked and the surface of a hot plate such that an approximately uniform temperature is obtained in the substrate during baking. In one embodiment, the substrate is positioned on a hot plate having a recess generally centered on its top side. The differences in distance between the edges of the substrates contacting the hot plate and the distance between the center region of the substrate and the bottom of the recess enable a generally uniform temperature to be obtained in the substrate.
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申请公布号 |
US2002086248(A1) |
申请公布日期 |
2002.07.04 |
申请号 |
US20010990791 |
申请日期 |
2001.11.16 |
申请人 |
DUPONT PHOTOMASKS, INC., A DELAWARE CORPORATION |
发明人 |
WEBSTER MICHAEL DAVID |
分类号 |
G03F1/08;H01L21/00;H01L21/027;H01L21/687;H05B3/74;(IPC1-7):G03F7/00;H01L21/31;H01L21/469;H01L21/26;H05B3/68 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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