| 摘要 |
To clean a semiconductor wafer without using a harmful liquid chemical solution such as piranha and organic solvent A vapor is generated by heating ultrapure water and it is blown to the surface of a semiconductor wafer at a temperature of 85° C. or higher. Even when the above-mentioned vapor is blown at a low pressure of 4.5 kg/cm2 or less, photoresist or an organic substance can be removed from the semiconductor wafer surface.
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