| 发明名称 |
Method of fabricating a liquid crystal display with reduced contact resistance |
| 摘要 |
A method of fabricating a liquid crystal display with reduced contact resistance is provided. The method comprises the steps of: depositing a buffer layer on a gate layer; and performing a thermal process to diffuse metal atoms of the buffer layer on the upper part of the gate, thereby forming a diffusion layer.
|
| 申请公布号 |
US2002086453(A1) |
申请公布日期 |
2002.07.04 |
| 申请号 |
US20010035071 |
申请日期 |
2001.12.28 |
| 申请人 |
KIM HYUN JIN;LEE HO NYEON;PARK JAE CHUL |
发明人 |
KIM HYUN JIN;LEE HO NYEON;PARK JAE CHUL |
| 分类号 |
G02F1/1368;G02F1/136;G02F1/1362;G09F9/00;G09F9/30;G09F9/35;H01L21/00;H01L21/3205;H01L21/4763;H01L21/768;H01L23/52;(IPC1-7):H01L21/00;H01L21/320;H01L21/476 |
主分类号 |
G02F1/1368 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
