| 摘要 |
<p>A calibrating member (200) for calibrating an electron beam irradiation position in an electron beam exposure system, comprising a substrate (202), and a mark unit (204) provided on the substrate (202), for detecting an electron beam irradiation position. The mark unit (204) may have electron-beam-irradiated upper portion (204a) larger in area than a lower portion (204b). The substrate (202) may have a groove unit (206) in a region adjacent to the mark unit (204).</p> |
