发明名称 PHOTPHATE SEALING FRITS WITH IMPROVED H20 DURABILITY
摘要 <p>Glass frit compositions, calculated in mole percent on an oxide basis, consisting essentially of 24.5 to 29.0 P2O5; 1.0 to 5.0 % B2O3; 1.0 to 2.0 % Al2O3; and sufficient amounts of SnO and ZnO (51.5 to 66.5 SnO, and 5.0-12.0 % ZnO), wherein the molar ratio of SnO:ZnO is in the range of about 5.0:1 to 12:1, and 0.0 to 2.0 % SiO2. The glass compositions exhibit, under NMR spectroscopic analysis of 11B nuclei, a signal containing at least two peaks at a chemical shift in the range of approximately -18 to -25 ppm. The frit compositions is useful in an optoelectric device that employs the sealing material that comprises a frit made form the glass compositions. In particular, in a Bragg grating, the inventive glass frit (1) is employed to attach a stripped optical fiber (3) to a beta-eucryptite substrate (5) to achieve athermalization. The stripped fiber (3) is attached to the substrate with a dollop of epoxy resin (7).</p>
申请公布号 WO2002051765(A1) 申请公布日期 2002.07.04
申请号 US2001045779 申请日期 2001.10.31
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