| 发明名称 |
Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 摘要 |
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.
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| 申请公布号 |
US2002086554(A1) |
申请公布日期 |
2002.07.04 |
| 申请号 |
US20000749924 |
申请日期 |
2000.12.29 |
| 申请人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E.;CHANG CHRISTOPHER C. |
发明人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E.;CHANG CHRISTOPHER C. |
| 分类号 |
C23C16/44;C23C30/00;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):B32B15/04;H01L21/31;H01L21/469 |
主分类号 |
C23C16/44 |
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