Apparatus for layout designing of semiconductor device, method of layout designing, and semiconductor device

摘要

A layout designing apparatus and a layout designing method that can improve the uniformity of the pattern density of a layout pattern in which dummy patterns are formed, and a semiconductor device manufactured using the layout designing method can be obtained. The layout designing method includes the steps of entering a plurality of circuit patterns of a semiconductor device; recognizing the positional data of the entered plurality of circuit patterns; producing a dummy pattern group including a plurality of dummy patterns, each of which being arranged per repetitive distance determined based on the recognized positional data of the circuit patterns; extracting a final dummy pattern including a dummy pattern located in a region not overlapping with the circuit patterns from the dummy pattern group; and outputting a layout pattern including the extracted final dummy pattern and the circuit patterns.