发明名称 Apparatus and a method for forming an alloy layer over a substrate
摘要 One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.
申请公布号 US2002086526(A1) 申请公布日期 2002.07.04
申请号 US20000752492 申请日期 2000.12.29
申请人 发明人 GAVISH ILAN
分类号 C23C16/00;C23C16/04;C23C16/06;C23C16/16;C23C16/48;C23C16/56;H01L21/285;H01L21/3205;H01L21/4763;H01L21/768;(IPC1-7):C23C16/00;G06F19/00;H01L21/44 主分类号 C23C16/00
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