| 摘要 |
PURPOSE: Provided is a device for analyzing a linear exposure pattern, which can improve convenience of measurement and decrease a measuring time by using ellipsometry during measurement of line width of linear pattern produced by exposure process. CONSTITUTION: The device, which is for yielding an information on line width of sample(30) having linear exposure pattern, comprises an analyzer(100) which consists of light source(10), polarized light generator(20), polarized light analyzer(40), and detector(50), and on which sample(30) having linear exposure pattern is located; and a processor(200) which consists of input part(60), storage part(70), output part(80), and operating part(90), and on which effective medium' algorithm premising an optical anisotropy is loaded. |
