A METHOD AND SYSTEM FOR REDUCING PHOTO-ASSISTED CORROSION IN WAFERS DURING CLEANING PROCESSES

摘要

A cover to be disposed over a substrate processing apparatus is provided. The cover includes a material capable of being tuned between an opaque state and a transparent state. Being tuned closer to the opaque state limits an amount of light capable of passing through the tunable cover and into the substrate processing apparatus during substrate processing. Being tuned closer to the transparent state allows viewing into the substrate processing apparatus without removing the cover.