发明名称 |
Semiconductor device, method for manufacturing same and thin plate interconnect line member |
摘要 |
The present invention provides a low-profile and light-weight semiconductor device having improved product reliability and higher frequency performance. A multi-layer interconnect line structure is disposed just under circuit devices 410 a and 410 b. An Interlayer insulating film 405 that composes a part of the multi-layer interconnect line structure is formed of a material having a relative dielectric constant within a range from 1.0 to 3.7, and a dielectric loss tangent within a range from 0.0001 to 0.02.
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申请公布号 |
US7301228(B2) |
申请公布日期 |
2007.11.27 |
申请号 |
US20030725993 |
申请日期 |
2003.12.03 |
申请人 |
SANYO ELECTRIC CO., LTD.;KANTO SANYO SEMICONDUCTORS CO., LTD. |
发明人 |
USUI RYOSUKE;MIZUHARA HIDEKI;IGARASHI YUSUKE;KOJIMA NORIAKI;SAKAMOTO NORIAKI |
分类号 |
H01L23/04;H01L23/498;H05K1/00;H05K1/02;H05K3/20;H05K3/46 |
主分类号 |
H01L23/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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