发明名称 Exposure apparatus and method, device manufacturing method, and discharge lamp
摘要 <p>A sensor (23,24) is provided for identifying the type of discharge lamp (1) mounted as the light source of an exposure apparatus, and at least one of an optical condition, power-source condition and cooling condition is set based upon the identification made. For example, an optical condition is changed by adjusting the zoom lens (3) of an illuminating optical unit in dependence upon the type of discharge lamp (1). Alternatively, a power-source condition or discharge-lamp cooling performance is changed by setting the range of allowable power applied to the discharge lamp (1). &lt;IMAGE&gt;</p>
申请公布号 EP1220040(A2) 申请公布日期 2002.07.03
申请号 EP20020076057 申请日期 1999.03.22
申请人 CANON KABUSHIKI KAISHA 发明人 SATO, MITSUYA
分类号 H01L21/027;G03F7/20;(IPC1-7):G03F7/20 主分类号 H01L21/027
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