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发明名称
COMPOSITIONS FOR AND METHODS OF REDUCING/ELIMINATING SCRATCHES AND DEFECTS IN SILICON DIOXIDE CMP PROCESS
摘要
申请公布号
EP1218466(A1)
申请公布日期
2002.07.03
申请号
EP20000963316
申请日期
2000.09.05
申请人
INFINEON TECHNOLOGIES NORTH AMERICA CORP.;INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
NOJO, HARUKI;SCHUTZ, RONALD, J.;RAMACHANDRAN, RAVIKUMAR
分类号
B24B37/00;C09G1/02;H01L21/304;H01L21/3105;(IPC1-7):C09G1/02;H01L21/310
主分类号
B24B37/00
代理机构
代理人
主权项
地址
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