发明名称 Method of manufacturing surface acoustic wave device
摘要 A method of manufacturing a surface acoustic device having an electrode containing an Al and an other metal comprising; forming patterning a layer of an Al and other metal forming the electrode by reactive ion etching which is conducted by using an etching gas containing a mixed gas comprising Cl2 and He at a gas pressure of 0.1 Pa to 3 Pa.
申请公布号 US6413439(B1) 申请公布日期 2002.07.02
申请号 US19990437832 申请日期 1999.11.10
申请人 FUJITSU LIMITED;FUJITSU MEDIA DEVICES LIMITED 发明人 NISHIHARA TOKIHIRO;IKATA OSAMU;SATOH YOSHIO
分类号 H01L21/302;H01L21/3065;H03H3/08;H03H9/25;(IPC1-7):H01L41/08 主分类号 H01L21/302
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