| 摘要 |
An economical, high capacity, multi-chamber target presentation unit is used in the ion beam processing of semiconductor wafers in the fabrication of integrated circuits. The multi-chamber target presentation unit comprises a central vacuum chamber where the semiconductor wafers are processed and two symmetrically disposed lateral vacuum chambers wherein one of the lateral vacuum chambers is the loading chamber into which the semiconductor wafers which are mounted on cassettes are loaded, while the other lateral vacuum chamber is the discharge chamber into which the semiconductor wafers are transferred after processing. The cassettes with mounted wafers are conveyed from one vacuum chamber to another by means of several screw conveyors and a looped chain conveyor. The present invention continuously processes large semiconductor wafers both efficiently and economically. The present invention has a large capacity and a high throughput being able to continuously process a large number of semiconductor wafers in a relatively short period of time.
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