发明名称 Use of palladium in IC manufacturing
摘要 An apparatus and a method for forming a substrate having a palladium metal layer over at least one contact point of the substrate and having a flexible conductive polymer bump, preferably a two-stage epoxy, on the palladium plated contact point. The present invention also relates to assemblies comprising one or more of these substrates.
申请公布号 US6413862(B1) 申请公布日期 2002.07.02
申请号 US20000645947 申请日期 2000.08.25
申请人 发明人
分类号 H01L21/288;H01L21/48;H01L21/56;H01L21/60;H01L23/485;H01L23/498;H05K3/24;H05K3/32;(IPC1-7):H01L21/44 主分类号 H01L21/288
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