发明名称 |
Cathode arc source for metallic and dielectric coatings |
摘要 |
A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.
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申请公布号 |
US6413387(B1) |
申请公布日期 |
2002.07.02 |
申请号 |
US20000529966 |
申请日期 |
2000.10.12 |
申请人 |
FILPLAS VACUUM TECHNOLOGY PTE LTD. |
发明人 |
SHI XU;TAY BENG KANG;TAN HONG SIANG |
分类号 |
C23C14/24;C23C14/32;H01J37/32;(IPC1-7):C25B9/00;C23C14/34 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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