| 摘要 |
PURPOSE: A process of preparing quartz glass containing a metal element and a quartz glass jig which have improved plasma corrosion resistance, especially for F-base plasma gas is provided. The products are used for jig materials for plasma reaction in manufacture of semiconductor devices. CONSTITUTION: The quartz glass contains a metal element and has no granular structure inside, the concentration of the metal element is 0.1 to 20% by weight, the content of foams and foreign substances is 100 mm¬2 or less in a projected area per 100 cm¬3, and the inner visible light transmissivity is 50%/cm or more. In methods for making quartz glass, 1 to 50% by weight of quartz glass powder having a particle size of 0.01 to 1,000μm is mixed with a metal element in pure water, an acidic solution, alkali solution or organic solvent and then heated.
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