| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a dry etching apparatus in which a damage removing unit is stably operated before the exhaust of etching starts. SOLUTION: A turbo-pump 15, a damage removing unit 16, and a dry pump 17 are provided in this order on the exhaust pipe 14 of an etching chamber 10 and an exhaust gas passes through them. The damage removing unit 16 is a plasma unit that excites plasma in the exhaust gas to heat the exhaust gas, thereby decomposing carbon-fluorinated base compositions after the exhaust gas passes on a catalyst. The damage removing unit 16 is provided with a pressure detecting mechanism 18. An exhaust control mechanism 19 is provided in which an inert gas is flowed to the exhaust side before an etching gas is introduced into the chamber 10 and before the etching gas is introduced, the damage removing unit 16 detects an exhaust pressure by the inert gas and starts a damage removing processing (exciting plasma).</p> |
