发明名称 CHEMICAL TREATING DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a safe, efficient automatic cleaning device where the supply, addition, waste or the like of the chemical do not require any human, visual judgment and manual work. SOLUTION: The cleaning device has a liquid level sensor for detecting a reference liquid level position where a semiconductor wafer is completely dipped into the chemical in a treatment layer when the semiconductor wafer is to be dipped into the treatment layer. In a specified time after the liquid level sensor detects the shortage in the amount of the chemical, a chemical supply signal is outputted.
申请公布号 JP2002184744(A) 申请公布日期 2002.06.28
申请号 JP20010311710 申请日期 2001.10.09
申请人 SEIKO EPSON CORP 发明人 KOIKE HIDEHO
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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