| 摘要 |
PURPOSE: A method for preventing corrosion of an aluminum in CMP(Chemical Mechanical Polishing) is provided by using a dummy pattern. CONSTITUTION: In the method for preventing corrosions during CMP of an aluminum, a line area having a line-width of sub-micrometer has one percent more than of a total aluminum metallization including a line and a pad. Also, the aluminum metallization pattern is fabricated by connecting a main pattern to a dummy pattern. At this time, the dummy pattern area has smaller than that of the main pattern area. |
