LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide an improved filter, which selects a comparatively narrow wavelength band from a broadband radiation source to remove unwanted frequencies and is usable in a lithographic projector. SOLUTION: A lithographic projector uses a grating spectrum filter for filtering an EUV projection beam. The grating spectrum filter is preferably a blazed, grazing incident reflection type grating. A cooling channel can be mounted in the grating spectrum filter or on its backside, and the grating spectrum filter can be formed of a material, which becomes invisible effectively with respect to desired radiations.