发明名称 ELECTRON BEAM LITHOGRAPHY SYSTEM
摘要 PROBLEM TO BE SOLVED: To reduce action which gives unexpected deflection to electron beam, which is caused by flow of a part of a current, flowing into the ground of a device, to a mirror body. SOLUTION: Each shielding ground of coaxial cables 4, 15 at the side of an electron beam mirror body 7 is connected to a conductive member 23, and one place of the conductive member 23 and one place of the electron beam mirror body 7 are connected by a ground line 22. Furthermore, the conductive member 23 is connected to a ground 20 by a ground earth line 19, and all the current I2, which causes deflection in electron beam 10, is made to flow via the conductive member 23. Thereby, the electric potential of the electron beam mirror body 7 is made the same potential as that of the conductive member 23, which is held at the ground potential.
申请公布号 JP2002184674(A) 申请公布日期 2002.06.28
申请号 JP20000383116 申请日期 2000.12.12
申请人 HITACHI LTD 发明人 OKUMURA MASAHIDE
分类号 G03F7/20;H01J37/16;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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