| 摘要 |
PROBLEM TO BE SOLVED: To adjust lighting distribution in an irradiation surface and make a pupil shape of illumination optical flux to each place of the irradiation surface almost uniform, when lighting conditions are changed. SOLUTION: The device has secondary light source formation means (2, 3) for forming a secondary light source, which consists of a number of light sources, at a position of a lighting pupil, waveguide optical systems (5, 7, 9) for guiding optical flux from a secondary light source formation means to an irradiation surface (10), lighting field apertures (6, 12) having a light transmitting part for regulating a lighting region in an irradiation surface and optical shape uniformizing means (5a, 5b) for making the cross-sectional contour of lighting optical flux to a plurality of places of an irradiation surface almost uniform. The light transmitting part has a variable edge for adjusting lighting distribution in a lighting region.
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