发明名称 NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
摘要 A nonvolatile memory device includes a semiconductor substrate, a charge trap layer formed on the semiconductor substrate, a blocking layer formed on the charge trap layer, and a gate electrode formed on the blocking layer. Sides of blocking layer extend laterally beyond sides of the charge trap layer and lateral sides of the gate electrode.
申请公布号 US2009008701(A1) 申请公布日期 2009.01.08
申请号 US20060555126 申请日期 2006.10.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DONG-HYUN;MIN GYUNG-JIN;KANG CHANG-JIN;CHUNG SEUNG-PIL
分类号 H01L29/00;H01L21/3205 主分类号 H01L29/00
代理机构 代理人
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