| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for accurately measuring the amount of spherical aberrations which causes dimensional variations, by obtaining a best focus-shift amount of one kind of a fine pattern. SOLUTION: In the method for correcting spherical aberration of a projection lens of an aligner used for photolithographic processing, a best focus-shift amount is obtained at a pitch to satisfy conditions of formulas (1)λ/(P×NA)}+σ<=1 and (2) (2×λ)/(P×NA)}-σ>=1 by exposing a hole pattern, whose mask size M formed in a phase shift type half-tone mask is 0.8 times or larger and 1.2 time or smaller a value ofλ/(2×NA); (whereλis exposure wavelength, NA is numerical aperture, andσis illuminationσ). Spherical aberrations of the projection lens of an aligner is corrected, based on the obtained best focus-shift amount.
|
