发明名称 CHARGED PARTICLE BEAM MICROSCOPE DEVICE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTION METHOD AND ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide an electron microscope device using a short focus objective lens that enables acquiring a good image of high resolution without any distortion in a wide range from low magnification to high magnification at the observation in low acceleration voltage condition. SOLUTION: In the electron microscope device that is constructed of an electron source 1, a focus lens 2, an upper stage deflection coil 4, a lower stage deflection coil 5, an objective lens 7, and a correction magnetic field lens 9 for electron beam deflection or the like, the distortion aberration that is generated in the objective lens 7 is cancelled by the reverse direction distortion aberration caused by the correction magnetic field lens 9 for electron deflection, and a good scanning electron microscopic image having a high resolution without any distortion in a wide range from low magnification to high magnification is obtained.
申请公布号 JP2002184336(A) 申请公布日期 2002.06.28
申请号 JP20000377027 申请日期 2000.12.12
申请人 HITACHI LTD 发明人 NAKAMURA KUNIYASU;KANDA KIMIO;SATO MITSUGI;ICHIHASHI MIKIO;SHINADA HIROYUKI;TOKIDA RURIKO
分类号 G03F7/20;H01J37/141;H01J37/147;H01J37/153;H01J37/28;H01L21/027;(IPC1-7):H01J37/153 主分类号 G03F7/20
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