发明名称 |
CHARGED PARTICLE BEAM MICROSCOPE DEVICE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTION METHOD AND ELECTRON MICROSCOPE |
摘要 |
PROBLEM TO BE SOLVED: To provide an electron microscope device using a short focus objective lens that enables acquiring a good image of high resolution without any distortion in a wide range from low magnification to high magnification at the observation in low acceleration voltage condition. SOLUTION: In the electron microscope device that is constructed of an electron source 1, a focus lens 2, an upper stage deflection coil 4, a lower stage deflection coil 5, an objective lens 7, and a correction magnetic field lens 9 for electron beam deflection or the like, the distortion aberration that is generated in the objective lens 7 is cancelled by the reverse direction distortion aberration caused by the correction magnetic field lens 9 for electron deflection, and a good scanning electron microscopic image having a high resolution without any distortion in a wide range from low magnification to high magnification is obtained.
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申请公布号 |
JP2002184336(A) |
申请公布日期 |
2002.06.28 |
申请号 |
JP20000377027 |
申请日期 |
2000.12.12 |
申请人 |
HITACHI LTD |
发明人 |
NAKAMURA KUNIYASU;KANDA KIMIO;SATO MITSUGI;ICHIHASHI MIKIO;SHINADA HIROYUKI;TOKIDA RURIKO |
分类号 |
G03F7/20;H01J37/141;H01J37/147;H01J37/153;H01J37/28;H01L21/027;(IPC1-7):H01J37/153 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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