发明名称 SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To protect a cleavage plane against damage in a cleavage process. SOLUTION: A semiconductor wafer 2 provided with marking-off lines corresponding to cleavage positions on its top surface is placed on the adhesive surface of an adhesive oriented sheet 3 whose ends are both firmly fixed, a convex stage 5 is arranged so as to make its longer direction parallel with the marking-off lines and lifted up to push up the semiconductor wafer 2, by which the semiconductor wafer 2 is cleaved along the marking-off lines. At this point, as the sheet 3 is oriented, the semiconductor wafer 2 is cut into several bars, the cleavage planes of the bars are hardly brought into contact with each other.
申请公布号 JP2002184723(A) 申请公布日期 2002.06.28
申请号 JP20000379024 申请日期 2000.12.13
申请人 SONY CORP 发明人 SAITO KAZUNARI
分类号 H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L21/301
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