SUBSTRATE TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating device for increasing the temperature of the removing liquid safely without causing any bumping phenomenon when increasing the temperature of the liquid that is composed by a constituent obtained by mixing a plurality of chemical. SOLUTION: A section 42 for heating the removing liquid is arranged in a circulation path 43 of the liquid, and comprises a section 44 that is composed by such translucent member as quartz for receiving the liquid at the inner space 45, and a halogen lamp 47 that is arranged in a recess 46 being formed at the section 44 for removing the liquid. The halogen lamp 47 functions as a light source for heating the liquid in the inner space 45 by applying light to the liquid to be removed in the inner space at the section 44 for receiving the liquid via the translucent section 44 for receiving the liquid.